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Energy-Band Engineering for Improved Charge Retention in Fully Self-Aligned Double Floating-Gate Single-Electron Memories
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Document type | Article de périodique (Journal article) – Article de recherche |
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Access type | Accès restreint |
Publication date | 2011 |
Language | Anglais |
Journal information | "Nano Letters : a journal dedicated to nanoscience and nanotechnology" - Vol. 11, no. 11, p. 4520-4526 (3 octobre 2011) |
Peer reviewed | yes |
Publisher | American Chemical Society ((United States) Washington) |
issn | 1530-6984 |
e-issn | 1530-6992 |
Publication status | Publié |
Affiliations |
UCL
- SST/ICTM/ELEN - Pôle en ingénierie électrique IEMN/ISEN UMR CNRS 8520 - Institut d'Electronique, de Microélectronique et de Nanotechnologie University Stuttgart - Institut für Halbleitertechnik Tyndall National Institute - University College Cork |
Links |
Bibliographic reference | Tang, Xiaohui ; Krzeminski, Christophe ; Lecavalier des Etangs-Levallois, Aurélien ; Chen, Zhenkun ; Dubois, Emmanuel ; et. al. Energy-Band Engineering for Improved Charge Retention in Fully Self-Aligned Double Floating-Gate Single-Electron Memories. In: Nano Letters : a journal dedicated to nanoscience and nanotechnology, Vol. 11, no. 11, p. 4520-4526 (3 octobre 2011) |
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Permanent URL | http://hdl.handle.net/2078.1/93789 |