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Erbium Silicide Growth in the Presence of Residual Oxygen

Bibliographic reference Reckinger, Nicolas ; Tang, Xiaohui ; Godey, Sylvie ; Dubois, Emmanuel ; Laszcz, Adam ; et. al. Erbium Silicide Growth in the Presence of Residual Oxygen. In: Journal of the Electrochemical Society, Vol. 158, no. 7, p. H715-H723 (11/05/2011)
Permanent URL http://hdl.handle.net/2078.1/85012
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