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Investigation and optimization of traps properties in Al2O3/SiO2 dielectric stacks

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Yan, Yiyi [UCL] Kilchytska, Valeriya [UCL] Faniel, Sébastien [UCL] Flandre, Denis [UCL] Raskin, Jean-Pierre [UCL]

In this work, the properties of the interface traps between various Al2O3/SiO2 dielectric stacks and Si substrate are investigated by the conductance method. The trap state density and energy level distribution in the silicon bandgap are extracted for four stacks fabricated by different processes. Our results indicate that the trap state density can be optimized so that Al2O3/SiO2 can be advantageous for nano-scale transistors and resistive switching memory.

Document type Communication à un colloque (Conference Paper) – Présentation orale avec comité de sélection
Access type Accès libre
Publication date 2022
Language Anglais
Conference "The 8th Joint International EuroSOI Workshop and International Conference on Ultimate Integration on Silicon - EuroSOI-ULIS'2022", Udine, Italy (du 18/05/2022 au 20/05/2022)
Peer reviewed yes
Host document "The 8th Joint International EuroSOI Workshop and International Conference on Ultimate Integration on Silicon - EuroSOI-ULIS'2022"
Publication status Publié
Affiliation UCL - SST/ICTM/ELEN - Pôle en ingénierie électrique
Links
Bibliographic reference Yan, Yiyi ; Kilchytska, Valeriya ; Faniel, Sébastien ; Flandre, Denis ; Raskin, Jean-Pierre. Investigation and optimization of traps properties in Al2O3/SiO2 dielectric stacks.The 8th Joint International EuroSOI Workshop and International Conference on Ultimate Integration on Silicon - EuroSOI-ULIS'2022 (Udine, Italy, du 18/05/2022 au 20/05/2022). In: The 8th Joint International EuroSOI Workshop and International Conference on Ultimate Integration on Silicon - EuroSOI-ULIS'2022, 2022
Permanent URL http://hdl.handle.net/2078.1/269853