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Fabrication process for applying high mechanical stress on monocrystalline silicon film

Bibliographic reference Passi, Vikram ; Bhaskar, Umesh Kumar ; Pardoen, Thomas ; Raskin, Jean-Pierre. Fabrication process for applying high mechanical stress on monocrystalline silicon film.6th International SemOI Conference and 1st Ukrainian-French Seminar “Semiconductor-on-Insulator materials, devices and circuits: physics, technology and diagnostics” (Kyiv, Ukraine, du 25/10/2010 au 28/10/2010). In: Proceedings of the 6th International SemOI Conference and 1st Ukrainian-French Seminar “Semiconductor-on-Insulator materials, devices and circuits: physics, technology and diagnostics”, 2010, p.pp. 125-126
Permanent URL http://hdl.handle.net/2078.1/87072