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A single layer hydrogen silsesquioxane based lift-off process for germanium and platinum

Bibliographic reference Passi, Vikram ; Lecestre, Aurélie ; Krzeminski, Christophe ; Larrieu, Guilhem ; Dubois, Emmanuel ; et. al. A single layer hydrogen silsesquioxane based lift-off process for germanium and platinum. In: Microelectronic Engineering, Vol. 87, no. 10, p. 1872-1878 (October 2010)
Permanent URL http://hdl.handle.net/2078.1/85541