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The spontaneous reaction of Cu(hfac) (TMVS) Vapor with DuPont Teflon AF1660

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Popovici, D [Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada] Sacher , E [Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada] Meunier, M [Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada] Martinu, L [Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada] Léonard, Didier [UCL] Bertrand, Patrick [UCL]

Preliminary X-ray photoelectron spectroscopic (XPS) and time-of-flight secondary ion mass spectroscopic (TOF-SIMS) measurements have confirmed the reaction of Teflon AF1600 with vapors of copper (hexafluoroacetylacetonate) (trimethyl vinyl silane) [C(hfac)(TMVS)], when exposed in the dark. XPS reveals the deposited copper to be in the Cu*II state, while TOF-SIMS has shown the organometallic to have lost its ligands in bonding to the surface.

Document type Communication à un colloque (Conference Paper)
Publication date 1996
Language Anglais
Conference "189th Meeting of the electrochemical society, symposium on Metallized Plastics: fundamental and applied aspects V", Los Angeles, USA (du 1996 au 1996)
Journal information "Electrochemical Society meeting Abstracts" - Vol. 96, no. 1, p. 393 (1996)
issn 1091-8213
Affiliations UCL - FSA/MAPR - Département des sciences des matériaux et des procédés
Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada - Dept Genie Physique
Ecole Polytechnique, Montreal, PQ H3C 3A7, Canada - Dept Engn Phys
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Bibliographic reference Popovici, D ; Sacher , E ; Meunier, M ; Martinu, L ; Léonard, Didier ; et. al. The spontaneous reaction of Cu(hfac) (TMVS) Vapor with DuPont Teflon AF1660.189th Meeting of the electrochemical society, symposium on Metallized Plastics: fundamental and applied aspects V (Los Angeles, USA, du 1996 au 1996). In: Electrochemical Society meeting Abstracts, Vol. 96, no. 1, p. 393 (1996)
Permanent URL http://hdl.handle.net/2078.1/84178