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Morphology of polystyrene films deposited by RF plasma

Bibliographic reference Haidopoulos, M. ; Mirabella, Frédéric ; Horgnies, M. ; Volcke, Cédric ; Thiry, Paul A. ; et. al. Morphology of polystyrene films deposited by RF plasma. In: Journal of microscopy-oxford, Vol. 228, no. 2, p. 227-239 (2007)
Permanent URL http://hdl.handle.net/2078.1/77227
  1. Barna P.B, Adamik M, Fundamental structure forming phenomena of polycrystalline films and the structure zone models, 10.1016/s0040-6090(97)00503-8
  2. Barranco V., Carpentier J., Grundmeier G., Correlation of morphology and barrier properties of thin microwave plasma polymer films on metal substrate, 10.1016/j.electacta.2003.12.030
  3. Berndt J, Hong S, Kovačević E, Stefanović I, Winter J, Dust particle formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin film deposition, 10.1016/s0042-207x(02)00767-4
  4. Bogaerts Annemie, Neyts Erik, Gijbels Renaat, van der Mullen Joost, Gas discharge plasmas and their applications, 10.1016/s0584-8547(01)00406-2
  5. Borer B., von Rohr Rudolf, Growth structure of SiOx films deposited on various substrate particles by PECVD in a circulating fluidized bed reactor, 10.1016/j.surfcoat.2005.01.054
  6. M. Callewaert (2004 ) Surface modification by stimuli-responsive polymers: from model systems to stainless steel cleanability . PhD Thesis , Universite Catholique de Louvain, Louvain-La-Neuve (Belgium).
  7. Carpentier J., Grundmeier G., Chemical structure and morphology of thin bilayer and composite organosilicon and fluorocarbon microwave plasma polymer films, 10.1016/j.surfcoat.2004.05.019
  8. Cech V., Chem. Papers, 53, 165 (1999)
  9. Cicala G., Diamond Rel. Phenom., 12, 2020 (2003)
  10. Cicala G., Milella A., Palumbo F., Rossini P., Favia P., d'Agostino R., Nanostructure and Composition Control of Fluorocarbon Films from Modulated Tetrafluoroethylene Plasmas, 10.1021/ma025536e
  11. Cunge G., Booth J. P., CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization, 10.1063/1.370296
  12. D'Agostino R., Plasma Deposition, Treatment and Etching of Polymers (1990)
  13. D'Agostino R., Pure Appl. Chem., 57, 1287 (1985)
  14. DENES F, Macromolecular plasma-chemistry: an emerging field of polymer science, 10.1016/j.progpolymsci.2004.05.001
  15. Dumay B., Finot E., Theobald M., Legaie O., Durand J., Baclet P., Goudonnet J. P., Structure of amorphous hydrogenated carbon films prepared by radio frequency plasma enhanced chemical vapor deposition. An analogy with the structure zone model developed for metals, 10.1063/1.1518795
  16. Dutta N. K., Tran N. D., Choudhury N. R., Perfluoro(methylcyclohexane) plasma polymer thin film: Growth, surface morphology, and properties investigated by scanning thermal microscopy, 10.1002/polb.20439
  17. Favia P., Cicala G., Milella A., Palumbo F., Rossini P., d'Agostino R., Deposition of super-hydrophobic fluorocarbon coatings in modulated RF glow discharges, 10.1016/s0257-8972(03)00123-3
  18. Finot E, Roualdes S, Kirchner M, Rouessac V, Berjoan R, Durand J, Goudonnet J.-P, Cot L, Surface investigation of plasma HMDSO membranes post-treated by CF4/Ar plasma, 10.1016/s0169-4332(01)01047-9
  19. Fu G. D., Kang E. T., Neoh K. G., Deposition of Nanostructured Fluoropolymer Films on Silicon Substrates via Plasma Polymerization of Allylpentafluorobenzene, 10.1021/jp036529a
  20. Grundmeier G, Thiemann P, Carpentier J, Shirtcliffe N, Stratmann M, Tailoring of the morphology and chemical composition of thin organosilane microwave plasma polymer layers on metal substrates, 10.1016/j.tsf.2003.09.043
  21. Grundmeier G., Thiemann P., Carpentier J., Barranco V., Tailored thin plasma polymers for the corrosion protection of metals, 10.1016/s0257-8972(03)00606-6
  22. Haïdopoulos Marie, Turgeon Stéphane, Laroche Gaétan, Mantovani Diego, Chemical and Morphological Characterization of Ultra-Thin Fluorocarbon Plasma-Polymer Deposition on 316 Stainless Steel Substrates: A First Step Toward the Improvement of the Long-Term Safety of Coated-Stents, 10.1002/ppap.200400066
  23. Li Guifang, Tobin Jeffrey A., Denton Denice D., Morphology of plasma polymerized methyl methacrylate films, 10.1063/1.111103
  24. Lieberman M.A., Principles of Plasma Discharges and Materials Processing (1994)
  25. Mahlberg R., Int. J. Adh., 18, 283 (1998)
  26. Messier R., Giri A. P., Roy R. A., Revised structure zone model for thin film physical structure, 10.1116/1.572604
  27. O'Keefe M. J., Rigsbee J. M., Influence of substrate material and ion bombardment on plasma-deposited fluorocarbon thin films, 10.1002/app.1994.070531209
  28. Park M., Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1 Square Centimeter, 10.1126/science.276.5317.1401
  29. Stoffels W. W., Stoffels E., Tachibana K., Polymerization of fluorocarbons in reactive ion etching plasmas, 10.1116/1.581016
  30. Švorčík V., Kolářová K., Slepička P., Macková A., Novotná M., Hnatowicz V., Modification of surface properties of high and low density polyethylene by Ar plasma discharge, 10.1016/j.polymdegradstab.2005.09.007
  31. Takahashi Kazuo, Tachibana Kunihide, Solid particle production in fluorocarbon plasmas. I. Correlation with polymer film deposition, 10.1116/1.1372901
  32. Teare D. O. H., Spanos C. G., Ridley P., Kinmond E. J., Roucoules V., Badyal J. P. S., Brewer S. A., Coulson S., Willis C., Pulsed Plasma Deposition of Super-Hydrophobic Nanospheres, 10.1021/cm011600f
  33. Tsankov D., Radeva E., Hinrichs K., Röseler A., Korte E.-H., Infrared spectroscopic ellipsometry and atomic force microscopy study of plasma polymerized hexamethyldisiloxane layers post-treated by NH3 plasma, 10.1016/j.tsf.2004.07.074
  34. Valsesia Andrea, Manso Silvan Miguel, Ceccone Giacomo, Rossi Francois, Surface topographic and structural characterization of plasma treated PMAA–PMMA copolymer films, 10.1016/j.susc.2004.04.033
  35. Wang Xuemei, Grundmeier Guido, Morphology and Patterning Processes of Thin Organosilicon and Perfluorinated Bi-Layer Plasma Polymer Films, 10.1002/ppap.200500063
  36. Wróbel A. M., Walkiewicz-Pietrzykowska A., Klemberg-Sapieha J. E., Hatanaka Y., Aoki T., Nakanishi Y., Remote hydrogen plasma chemical vapor deposition of silicon-carbon thin-film materials from a hexamethyldisilane source: Characterization of the process and the deposits : Silicon-Carbon Thin-Film Materials, 10.1002/app.11304
  37. Yang G. H., Oh S. W., Kang E. T., Neoh K. G., Plasma polymerization and deposition of linear, cyclic and aromatic fluorocarbons on (100)-oriented single crystal silicon substrates, 10.1116/1.1513640
  38. Yasuda H., Plasma Polymerization (1985)