User menu

Electromigration-induced drift in damascene vs. conventional interconnects : an intrinsic difference

Bibliographic reference Proost, Joris ; Samajdar, I. ; Witvrouw, A. ; Maex, K.. Electromigration-induced drift in damascene vs. conventional interconnects : an intrinsic difference.the Materials Research Society Symposium (San Francisco - CA, 1998). In: Proceedings , 1998, p. 89
Permanent URL http://hdl.handle.net/2078/70955