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Incubation, time-dependent drift and saturation during Al-Si-Cu electromigration : modeling and implications for design

Bibliographic reference Witvrouw, A. ; Roussel, Ph. ; Beyer, G. ; Proost, Joris ; Maex, K.. Incubation, time-dependent drift and saturation during Al-Si-Cu electromigration : modeling and implications for design.the IEEE International Interconnect Technology Conference (1998). In: Proceedings , 1998, p. 27
Permanent URL http://hdl.handle.net/2078/70952