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Electromigration behaviour of 0.3 µm damascene vs. plasma-etched interconnects : a lifetime and drift analysis

Bibliographic reference Proost, Joris ; Li, H. ; Brijs, B. ; Witvrouw, A. ; Maex, K.. Electromigration behaviour of 0.3 µm damascene vs. plasma-etched interconnects : a lifetime and drift analysis.the IEEE International Interconnect Technology Conference (San Francisco - CA, 1998). In: Proceedings , 1998, p. 110
Permanent URL http://hdl.handle.net/2078/70951