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A new scaling issue in the electrical behaviour of damascene vs. plasma-etched interconnects

Bibliographic reference Proost, Joris ; Conard, T. ; Boullart, W. ; Grillaert, J. ; Maex, K.. A new scaling issue in the electrical behaviour of damascene vs. plasma-etched interconnects.Mater. Res. Soc. Conference on Advanced Metallization and Interconnect Systems for ULSI Applications (San Diego - CA, 1998). In: Proceedings , 1998, p. 535
Permanent URL http://hdl.handle.net/2078/70950