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Ex-situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes

Bibliographic reference Holsteyns, F. ; Minsier, Vincent ; Proost, Joris ; Arnauts, S ; Arnauts, S. ; et. al. Ex-situ bubble generation, enhancing the particle removal rate for single wafer megasonic cleaning processes.8th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces (Antwerp, 2006). In: Proceedings , 2006, p. 151
Permanent URL http://hdl.handle.net/2078.1/70904