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Effect of dopants on the dissolution behaviour of silicon substrates in HF-based cleaning solutions

Bibliographic reference Abu Jeriban, Salima ; Guiot, Ivette ; Bacherius, Luc ; Proost, Joris ; Vos, R. ; et. al. Effect of dopants on the dissolution behaviour of silicon substrates in HF-based cleaning solutions.8th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces (Antwerp, 2006). In: Proceedings , 2006, p. 125
Permanent URL http://hdl.handle.net/2078.1/70900