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Electromigration threshold in damascene versus plasma-etched interconnects

Bibliographic reference Proost, Joris ; Maex, K. ; Delaey, L.. Electromigration threshold in damascene versus plasma-etched interconnects. In: Applied Physics Letters, Vol. 73, no. 19, p. 2748-2750 (1998)
Permanent URL http://hdl.handle.net/2078/70723
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