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Chemical and electrical characterisation of the interaction of BCl3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces

Bibliographic reference Proost, Joris ; Li, H. ; Conard, T. ; Boullart, W. ; Maex, K.. Chemical and electrical characterisation of the interaction of BCl3/Cl2 etching and CF4/H2O stripping plasmas with aluminum surfaces. In: Journal of The Electrochemical Society, Vol. 146, no. 11, p. 4230-4235 (1999)
Permanent URL http://hdl.handle.net/2078/70720