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Advantages of p/sup ++/ polysilicon etch stop layer versus p /sup ++/ silicon

Bibliographic reference Charavel, Rémy ; Laconte, J. ; Raskin, Jean-Pierre. Advantages of p/sup ++/ polysilicon etch stop layer versus p /sup ++/ silicon.Smart Sensors, Actuators, and MEMS (Maspalomas, Gran Canaria, Spain, 19-21 May 2003). In: SPIE - the International Society for Optical Engineering. Proceedings, Spie-int. soc. opt. eng2003, p.Vol. 5116, p. 699-709
Permanent URL http://hdl.handle.net/2078.1/68063