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The effect of plasma damage on the material composition and electrical performance of different generations of SiOC(H) low k films

Bibliographic reference Humbert, A. ; Badaroglu, D.E. ; Hoofman, R.J.O.M.. The effect of plasma damage on the material composition and electrical performance of different generations of SiOC(H) low k films.Materials, Technology and Reliability of Low-k Dielectrics and Cooper Interconnects (San Francisco, CA, USA, 18-21 April 2006). In: Tsui, T.Y.; Joo, Y.-C.; Michaelson, L.; Lane, M.; Volinsky, A.A.;, Materials, Technology and Reliability of Low-k Dielectrics and CooperInterconnects (Materials Research Society Symposium Proceedings Volume914), Materials research society2006, p. 259-264
Permanent URL http://hdl.handle.net/2078.1/67907