User menu

Buried mask revelation in silicon dioxide for double gate MOS fabrication

Bibliographic reference Charavel, Rémy ; Raskin, Jean-Pierre. Buried mask revelation in silicon dioxide for double gate MOS fabrication.2006 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems (Zhuhai, China, 18-21 January 2006). In: 2006 1st IEEE International Conference on Nano/Micro Engineered andMolecular Systems (IEEE Cat No. 06EX1290C), IEEE2006, p.5 pp.
Permanent URL http://hdl.handle.net/2078.1/67888