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ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides

Bibliographic reference Houssiau, L. ; Vitchev, RG ; Conard, T. ; Vandervorst, Wilfried ; Bender, H.. ToF-SIMS depth profiling of Hf and Al composition variations in ultrathin mixed HfO2/Al2O3 oxides.14th International Conference on Secondary Ion Mass Spectrometry (SIMS 14) (San Diego(Ca), Sep 14-19, 2003). In: Applied Surface Science, Vol. 231-2, p. 585-589 (2004)
Permanent URL http://hdl.handle.net/2078.1/61403