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Study of thermal stability of nickel silicide by X-ray reflectivity

Bibliographic reference Van Hove, Marie-Anne ; Travaly, Y. ; Sajavaara, T. ; Brijs, B. ; Vandervorst, Wilfried ; et. al. Study of thermal stability of nickel silicide by X-ray reflectivity. In: Microelectronic Engineering, Vol. 82, no. 3-4, p. 492-496 (2005)
Permanent URL http://hdl.handle.net/2078.1/60107