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Chemical and structural modifications in a 193-nm photoresist after low-k dry etch

Bibliographic reference Kesters, E. ; Claes, Marie-Thérèse ; Le, Q. T. ; Lux, M. ; Franquet, A. ; et. al. Chemical and structural modifications in a 193-nm photoresist after low-k dry etch.28th Dry Process Symposium (DPS) (Nagoya(Japan), Nov 29-30, 2006). In: Thin Solid Films, Vol. 516, no. 11, p. 3454-3459 (2008)
Permanent URL http://hdl.handle.net/2078.1/59281