User menu

Behaviour of CPW and TFMS lines at high temperature for RF applications in sub-45 nm nodes

Bibliographic reference Roda Neve, Cesar ; Farcy, A. ; Gallitre, M. ; Blampey, B. ; Meuris, P. ; et. al. Behaviour of CPW and TFMS lines at high temperature for RF applications in sub-45 nm nodes.18th European Workshop on Materials for Advanced Metallization (Grenoble(France), Mar 08-11, 2009). In: Microelectronic Engineering, Vol. 87, no. 3, p. 324-328 (2010)
Permanent URL http://hdl.handle.net/2078.1/58628