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Silo Isolation Technique - a Study of Active and Parasitic Device Characteristics With Semi-recessed and Fully-recessed Field Oxides

Bibliographic reference Coppee, JL. ; Vandewiele, F.. Silo Isolation Technique - a Study of Active and Parasitic Device Characteristics With Semi-recessed and Fully-recessed Field Oxides. In: Solid-State Electronics, Vol. 31, no. 5, p. 887-891 (1988)
Permanent URL http://hdl.handle.net/2078.1/53150