Wang, L.
Fjeldly, TA
Iniguez, B.
Slade, HC
Shur, M
We describe a new physics based, analytical de model accounting for short channel effects for hydrogenated amorphous silicon (a Si:H) thin film transistors (TFT's), This model is based on the long channel device model. Two important short-channel phenomena, self-heating and kink effect, are analyzed in detail. For self-heating effect, a thermal kinetic analysis is carried out and a physical model and an equivalent circuit are used to estimate the thermal resistance of the device. In deriving the analytical model for self-heating effect, a first order approximation and self-consistency are used to give an iteration-free model accurate for a temperature rise of,up to 100 degrees C. In the modeling of the kink effects, a semi-empirical approach is used based on the physics involved. The combined model accurately reproduces the de characteristics of a-Si:H TFT's with a gate length of the 4 mu m. Predictions for a-Si:PI TFT's scaled down to 1 mu m are also provided, The model is suitable for use in device and circuit simulators.
Bibliographic reference |
Wang, L. ; Fjeldly, TA ; Iniguez, B. ; Slade, HC ; Shur, M. Self-heating and kink effects in a-Si : H thin film transistors. In: IEEE Transactions on Electron Devices, Vol. 47, no. 2, p. 387-397 (2000) |
Permanent URL |
http://hdl.handle.net/2078.1/43723 |