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Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering

Bibliographic reference El Hajjam, Khalil ; Baboux, Nicolas ; Calmon, Francis ; Souifi, Abdelkader ; Poncelet, Olivier ; et. al. Highly transparent low capacitance plasma enhanced atomic layer deposition Al2O3-HfO2 tunnel junction engineering. In: Journal of Vacuum Science and Technology. Part A. Vacuum, Surfaces and Films, Vol. 32, no.1, p. 01A132 - 01A132-6 (01/2014)
Permanent URL http://hdl.handle.net/2078.1/140671