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Integration of Low Schottky Barrier Source/Drain for Advanced MOS Technology

Bibliographic reference Dubois, Emmanuel ; Darrieu, Guilhem ; Krzeminski, C. ; Baie, Xavier ; Tang, Xiaohui ; et. al. Integration of Low Schottky Barrier Source/Drain for Advanced MOS Technology.13TH NID Workshop 2004 (Athens (Greece), du 04/02/2004 au 06/02/2004). In: Proceedings of the 13TH NID Workshop 2004, 2004
Permanent URL http://hdl.handle.net/2078.1/135147