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The influence of residual oxidizing impurities on the synthesis of graphene by atmospheric pressure chemical vapor deposition

Bibliographic reference Reckinger, Nicolas ; Felten, Alexandre ; Nascimento Santos, Cristiane ; Hackens, Benoît ; Colomer, Jean-François. The influence of residual oxidizing impurities on the synthesis of graphene by atmospheric pressure chemical vapor deposition. In: Carbon Materials : chemistry and physics, Vol. 63, p. 84-91 (June 24 (June 24, 2013)
Permanent URL http://hdl.handle.net/2078.1/132948