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RF Plasma Annealing of Positive Charge Created by Fowler-Nordheim Electron Injection in the Buried Oxide of SIMOX SOI structures

Bibliographic reference Kilchytska, Valeriya ; Nazarov, Alexei ; Barchuk, I. ; Tkachenko, A. ; Ashok, D. ; et. al. RF Plasma Annealing of Positive Charge Created by Fowler-Nordheim Electron Injection in the Buried Oxide of SIMOX SOI structures.NATO Advanced Research Workshop on "Perspectives, Science and Technologies for Novel Silicon on Insulator Devices" (Kiev (Ukraine), du 15/10/2000 au 20/10/2000). In: Proceedings of the NATO Advanced Research Workshop on "Perspectives, Science and Technologies for Novel Silicon on Insulator Devices", 2000
Permanent URL http://hdl.handle.net/2078.1/132826