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Effect of RF plasma treatment on moving and accumulation charge in SiO2 layers of Al-polySi-SiO2-Si structures

Bibliographic reference Nazarov, Alexei ; Lysenko, V.S ; Mikhailov, S.N. ; Tkachenko, A.S. ; Pavluk, M.I. ; et. al. Effect of RF plasma treatment on moving and accumulation charge in SiO2 layers of Al-polySi-SiO2-Si structures. In: Mikroelectronika, Vol. 23, no.3, p. 39-46 (1994)
Permanent URL http://hdl.handle.net/2078.1/131559