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Behaviour of CPW and TFMS lines versus high temperature for RF applications in sub-45 nm nodes

Bibliographic reference Roda Neve, Cesar ; Farcy, A. ; Gallitre, M. ; Blampey, B. ; Meuris, P. ; et. al. Behaviour of CPW and TFMS lines versus high temperature for RF applications in sub-45 nm nodes.Eighteenth European Workshop on Materials for Advanced Metallization - MAM 2009 (Grenoble, France, du 08/03/2009 au 11/03/2009). In: Proceedings of the eighteenth European Workshop on Materials for Advanced Metallization - MAM 2009, 2009, p.pp. 165-166
Permanent URL http://hdl.handle.net/2078/123507