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Selective etching of implanted silicon-dioxide in hydrofluoric acid

Bibliographic reference Passi, Vikram ; Lecestre, A. ; Dubois, E. ; Raskin, Jean-Pierre. Selective etching of implanted silicon-dioxide in hydrofluoric acid.34th International Conference on Micro- and Nano-Engineering - MNE 2008 (Athens, Greece, du 15/09/2008 au 18/09/2008). In: Proceedings of the 34th International Conference on Micro- and Nano-Engineering - MNE 2008, 2008, p. 455 - Paper FAB-P32
Permanent URL http://hdl.handle.net/2078.1/123503