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Low Temperature Implementation of Dopant-Segregated Band-edge Metallic S/D junctions in Thin-Body SOI p-MOSFETs

Bibliographic reference Larrieu, G. ; Dubois, E. ; Valentin, R. ; Breil, N. ; Danneville, F. ; et. al. Low Temperature Implementation of Dopant-Segregated Band-edge Metallic S/D junctions in Thin-Body SOI p-MOSFETs.IEEE International Electron Devices Meeting - IEDM 2007 (Washington, DC, USA, du 10/12/2007 au 12/12/2007). In: Proceedings of the IEEE International Electron Devices Meeting - IEDM 2007, IEEE2007, p.pp. 147-150
Permanent URL http://hdl.handle.net/2078.1/123408