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Tuning of etching rate by implantation: silicon, polysilicon and oxide

Bibliographic reference Charavel, Rémy ; Raskin, Jean-Pierre. Tuning of etching rate by implantation: silicon, polysilicon and oxide.16th International Conference of Ion Implantation Technology – ITT’06 (Marseille, France, du 11/06/2006 au 16/06/2006). In: Proceedings of the 16th International Conference of Ion Implantation Technology – ITT’06, 2006, p.pp. 325-328
Permanent URL http://hdl.handle.net/2078.1/123234