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Underetch reduction by highly selective etching of oxide
Primary tabs
| Document type | Communication à un colloque (Conference Paper) – Présentation orale sans comité de sélection |
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| Publication date | 2006 |
| Language | Anglais |
| Conference | "IEEE International Conference on Nano/Micro Egineered and Molecular Systems", Zhuhai, China (du 18/01/2006 au 21/01/2006) |
| Host document | "Proceedings of the IEEE International Conference on Nano/Micro Egineered and Molecular Systems"- p. Session 3E2.1-Paper 424 |
| Publication status | Publié |
| Affiliation | UCL - FSA/ELEC - Département d'électricité |
| Links |
| Bibliographic reference | Charavel, Rémy ; Raskin, Jean-Pierre. Underetch reduction by highly selective etching of oxide.IEEE International Conference on Nano/Micro Egineered and Molecular Systems (Zhuhai, China, du 18/01/2006 au 21/01/2006). In: Proceedings of the IEEE International Conference on Nano/Micro Egineered and Molecular Systems, 2006, p. Session 3E2.1-Paper 424 |
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| Permanent URL | http://hdl.handle.net/2078.1/123211 |