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Underetch reduction by highly selective etching of oxide

Bibliographic reference Charavel, Rémy ; Raskin, Jean-Pierre. Underetch reduction by highly selective etching of oxide.IEEE International Conference on Nano/Micro Egineered and Molecular Systems (Zhuhai, China, du 18/01/2006 au 21/01/2006). In: Proceedings of the IEEE International Conference on Nano/Micro Egineered and Molecular Systems, 2006, p. Session 3E2.1-Paper 424
Permanent URL http://hdl.handle.net/2078.1/123211