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Fabrication of self aligned double gate MOS transistor

Bibliographic reference Charavel, Rémy ; Raskin, Jean-Pierre. Fabrication of self aligned double gate MOS transistor.Union Radio-Scientifique Internationale (U.R.S.I.) (Brussels, Belgium, 18/12/2003). In: Proceedings of the Union Radio-Scientifique Internationale (U.R.S.I.), 2003, p.pp. 37-38
Permanent URL http://hdl.handle.net/2078.1/122938