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A fluoro-ethoxysilane-based stiction-free release process for submicron gap MEMS

Bibliographic reference Parvais, Bertrand ; Pallandre, Antoine ; Jonas, Alain M. ; Raskin, Jean-Pierre. A fluoro-ethoxysilane-based stiction-free release process for submicron gap MEMS.Nanotechnology Conference and Trade Show (San Francisco, CA, USA, du 23/02/2003 au 27/02/2003). In: Nanotech 2003 Vol. 1 Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 1 - Chapter 13: Wafer and MEMS Processing, 2003, p.pp. 522-525
Permanent URL http://hdl.handle.net/2078.1/122616