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Point Defect Clusters and Dislocations in FIB Irradiated Nanocrystalline Aluminum Films: An Electron Tomography and Aberration-Corrected High-Resolution ADF-STEM Study

Onglets principaux

Idrissi, Hosni [University of Antwerp] Tumer, Stuart [University of Antwerp] Mitsuhara, Masatoshi [Kyushu University] Wang, Binjie [University of Antwerp] Hata, Satoshi [Kyushu University] Coulombier, Michaël [UCL] Raskin, Jean-Pierre [UCL] Pardoen, Thomas [UCL] Schryvers, Dominique [University of Antwerp]

Focused ion beam (FIB) induced damage in nanocrystalline Al thin films has been characterized using advanced transmission electron microscopy techniques. Electron tomography was used to analyze the three-dimensional distribution of point defect clusters induced by FIB milling, as well as their interaction with preexisting dislocations generated by internal stresses in the Al films. The atomic structure of interstitial Frank loops induced by irradiation, as well as the core structure of Frank dislocations, has been resolved with aberration-corrected high-resolution annular dark-field scanning TEM. The combination of both techniques constitutes a powerful tool for the study of the intrinsic structural properties of point defect clusters as well as the interaction of these defects with preexisting or deformation dislocations in irradiated bulk or nanostructured materials.

Type de document Article de périodique (Journal article) – Article de recherche
Année de publication 2011
Langue Anglais
Information sur le périodique "Microscopy and Microanalysis" - Vol. 17, no. 6, p. 983-990
Peer reviewed oui
Editeur Cambridge University Press ((United Kingdom) Cambridge)
issn 1431-9276
e-issn 1435-8115
Statut de la publication Publié
Affiliations University of Antwerp - EMAT, Department of Physics
Kyushu University - Department of Engineering Sciences for Electronics and Materials
Kyushu University - Department of Engineering Sciences for Electronics and Materials
UCL - SST/IMMC/IMAP - Materials and process engineering
UCL - SST/ICTM/ELEN - Pôle en ingénierie électrique
Mots-clés Nanocrystalline aluminum ; FIB ; Point defect clusters ; Electron tomography ; Aberration-corrected high-resolution ADF-STEM
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Référence bibliographique Idrissi, Hosni ; Tumer, Stuart ; Mitsuhara, Masatoshi ; Wang, Binjie ; Hata, Satoshi ; et. al. Point Defect Clusters and Dislocations in FIB Irradiated Nanocrystalline Aluminum Films: An Electron Tomography and Aberration-Corrected High-Resolution ADF-STEM Study. In: Microscopy and Microanalysis, Vol. 17, no. 6, p. 983-990
Permalien http://hdl.handle.net/2078.1/91713