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Journal article
Study of thermal stability of nickel silicide by X-ray reflectivity
Van Hove, Marie-Anne
[UCL]
Travaly, Y.
Sajavaara, T.
Brijs, B.
Vandervorst, Wilfried
[UCL]
Lauwers, A
Chamirian, O
Kittl, JA
Jonas, Alain M.
[UCL]
Maex, K
(2005)
Microelectronic Engineering — Vol. 82, no. 3-4, p. 492-496 (2005)