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Displaying 13 results.
    • Speech
    Underetch reduction by highly selective etching of oxide
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2006) IEEE International Conference on Nano/Micro Egineered and Molecular Systems — Zhuhai, China
    • Speech
    Fabrication of self aligned double gate MOS transistor
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2002) Union Radio-Scientifique Internationale (U.R.S.I.) — Brussels, Belgium
    • Speech
    Fabrication of multiple gate MOS devices for high speed and high frequency applications
    Charavel, Rémy[UCL] Olbrechts, Benoit[UCL] Passi, Vikram[UCL] Raskin, Jean-Pierre[UCL] (2006) Union Radio-Scientifique Internationale (U.R.S.I.) Benelux Meeting — Eindhoven, The Netherlands
    • Speech
    Tuning of etching rate by implantation: silicon, polysilicon and oxide
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2006) 16th International Conference of Ion Implantation Technology – ITT’06 — Marseille, France
    • Speech
    Fabrication of self aligned double gate MOS transistor
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2003) Union Radio-Scientifique Internationale (U.R.S.I.) — Brussels, Belgium
    • Speech
    Self alignment method by buried mask implantation for Double Gate MOS fabrication and nano devices fabrication
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2004) Optical Science, Sensors and Systems Technology, Architecture, Applications — Philadelphia, Pennsylvania, USA
    • Journal article
    Etch rate modification of SiO2 by ion damage
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2006) Electrochemical and Solid-State Letters — Vol. 9, no. 7, p. G245-G247 (2006)
    • Speech
    Buried mask revelation in silicon dioxide for double gate MOS fabrication
    Charavel, Rémy[UCL] Raskin, Jean-Pierre[UCL] (2006) 2006 1st IEEE International Conference on Nano/Micro Engineered and Molecular Systems — Zhuhai, China
    • Speech
    Advantages of p/sup ++/ polysilicon etch stop layer versus p /sup ++/ silicon
    Charavel, Rémy[UCL] Laconte, J. Raskin, Jean-Pierre[UCL] (2003) Smart Sensors, Actuators, and MEMS — Maspalomas, Gran Canaria, Spain
    • Speech
    Stress release of PECVD oxide by RTA
    Charavel, Rémy[UCL] Olbrechts, Benoit[UCL] Raskin, Jean-Pierre[UCL] (2003) Smart Sensors, Actuators, and MEMS — Maspalomas, Gran Canaria, Spain