Hierarchical Nanofabrication of Silicon and Polyaniline Optically-Active Lattices.

As a consequence of recent investigations that have used simple methods of lithography and material structuring, challenging the established Si nano-­ and micro-‐machining technologies, it has become apparent that hybrid organic-­inorganic nanoarchitectonics can provide a unified strategy for the next generation flexible and transparent electronics. Noticeably, electron-­‐beam lithography merged with an ingenious resist composition and exposure modulation profile has enabled the direct writing of polymer three-­dimensional lattices with periodicities and feature-­‐sizes suitable for visible-‐spectrum photonic crystals. These superstructures can be easily co-‐integrated via transfer printing techniques with Si substrata accommodating classical photonic lattices obtained by novel deep-­‐reactive ion etching protocols.