User menu

Accès à distance ? S'identifier sur le proxy UCLouvain

On the origin of damped electrochemical oscillations at silicon anodes (revisited)

Primary tabs

download
  • Open access
  • PDF
  • 1.18 M
Proost, Joris [UCL] Blaffart, Frédéric [UCL] Turner, S. [University of Antwerp] Idrissi, Hosni [UCL]

accepted

Document type Article de périodique (Journal article) – Article de recherche
Access type Accès libre
Publication date 2014
Language Anglais
Journal information "ChemPhysChem : a European journal of chemical physics and physical chemistry" - Vol. 15, no. 14, p. 3166-3124 (2014)
Peer reviewed yes
issn 1439-4235
e-issn 1439-7641
Publication status Publié
Affiliation UCL - SST/IMMC/IMAP - Materials and process engineering
Links
  1. Parkhutik Vitali, Silicon anodic oxides grown in the oscillatory anodisation regime – kinetics of growth, composition and electrical properties, 10.1016/s0038-1101(01)00058-2
  2. Lewerenz H.J., Aggour M., On the origin of photocurrent oscillation at Si electrodes, 10.1016/0022-0728(93)80231-6
  3. Ozanam F., Resonant and Nonresonant Behavior of the Anodic Dissolution of Silicon in Fluoride Media: An Impedance Study, 10.1149/1.2221252
  4. Miethe Iljana, Krischer Katharina, Ellipsomicroscopic studies of the anodic oxidation of p-type silicon in fluoride containing electrolytes during current oscillations, 10.1016/j.jelechem.2011.11.027
  5. Böhm S., Peter L.M., Schlichthörl G., Greef R., Ellipsometric and microwave reflectivity studies of current oscillations during anodic dissolution of p-Si in fluoride solutions, 10.1016/s0022-0728(00)00397-1
  6. Lobnig R. E., Atmospheric Corrosion of Copper in the Presence of Acid Ammonium Sulfate Particles, 10.1149/1.1838371
  7. Cattarin Sandro, Decker Franco, Dini Danilo, Margesin Benno, In-situ detection of stress in oxide films during Si electrodissolution in acidic fluoride electrolytes, 10.1016/s0022-0728(99)00348-4
  8. Dini Danilo, Cattarin Sandro, Decker Franco, Probe beam deflection study of p-Si electrodissolution in acidic fluoride medium in the oscillating regimes, 10.1016/s0022-0728(97)00630-x
  9. Parkhutik Vitali, Chu Y., You H., Nagy Z., Montano P.A., 10.1023/a:1009679432364
  10. Decker F, Pantano E, Dini D, Cattarin S, Maffi S, Razzini G, Use of the bending-beam-method for the study of the anodic oxidation of Si in dilute fluoride media, 10.1016/s0013-4686(00)00612-5
  11. Chazalviel Jean-Noël, Cortès Robert, Maroun Fouad, Ozanam François, Stratified structure of anodically formed mesoporous silica, 10.1002/pssa.200881044
  12. Grzanna Jürgen, Notz Thilo, Lewerenz Hans-J., Stress induced one-dimensional model for current oscillations at the Si/electrolyte contact, 10.1002/pssc.200881028
  13. Lehmann V., On the Origin of Electrochemical Oscillations at Silicon Electrodes, 10.1149/1.1836636
  14. Blaffart Frédéric, Van Overmeere Quentin, Pardoen Thomas, Proost Joris, In situ monitoring of electrostriction in anodic and thermal silicon dioxide thin films, 10.1007/s10008-013-2036-0
  15. Van Overmeere Q., Vanhumbeeck J.-F., Proost J., On the use of a multiple beam optical sensor for in situ curvature monitoring in liquids, 10.1063/1.3385432
  16. Parkhutik V.P., Kinetics, composition and mechanism of anodic oxide growth on silicon in water-containing electrolytes, 10.1016/0013-4686(91)85014-x
  17. Vanhumbeeck J.-F., Proost J., On the contribution of electrostriction to charge-induced stresses in anodic oxide films, 10.1016/j.electacta.2007.11.028
  18. Van Overmeere Q., Blaffart F., La Mantia F., Di Quarto F., Proost J., Electromechanical coupling in anodic niobium oxide: Electric field-induced strain, internal stress, and dielectric response, 10.1063/1.4729319
  19. Lee Ho Young, Peng Yiyan, Shkel Yuri M., Strain-dielectric response of dielectrics as foundation for electrostriction stresses, 10.1063/1.2073977
  20. McMeeking Robert M., Landis Chad M., Electrostatic Forces and Stored Energy for Deformable Dielectric Materials, 10.1115/1.1940661
  21. Zhao Xuanhe, Suo Zhigang, Electrostriction in elastic dielectrics undergoing large deformation, 10.1063/1.3031483
  22. Landau, Electrodynamics of Continuous Media (1960)
  23. Schönleber Konrad, Krischer Katharina, High-Amplitude versus Low-Amplitude Current Oscillations during the Anodic Oxidation of p-Type Silicon in Fluoride Containing Electrolytes, 10.1002/cphc.201200230
  24. Foca E., Carstensen J., Föll H., Modelling electrochemical current and potential oscillations at the Si electrode, 10.1016/j.jelechem.2007.01.019
  25. Chazalviel J.-N., Ionic processes through the interfacial oxide in the anodic dissolution of silicon, 10.1016/0013-4686(92)85038-m
  26. Nafría M., Suñé J., Aymerich X., Breakdown of thin gate silicon dioxide films—A review, 10.1016/0026-2714(96)00023-6
  27. Dimaria D.J, Defect production, degradation, and breakdown of silicon dioxide films, 10.1016/s0038-1101(97)00006-3
  28. Verweij J.F., Klootwijk J.H., Dielectric breakdown I: A review of oxide breakdown, 10.1016/0026-2692(95)00104-2
  29. Kostinski Sarah, Pandey Ravindra, Gowtham S., Pernisz Udo, Kostinski Alexander, Diffusion of Water Molecules in Amorphous Silica, 10.1109/led.2012.2189750
  30. Jin Young-Gu, Chang K. J., Mechanism for the Enhanced Diffusion of Charged Oxygen Ions inSiO2, 10.1103/physrevlett.86.1793
  31. Jorgensen Paul J., Effect of an Electric Field on Silicon Oxidation, 10.1063/1.1733177
Bibliographic reference Proost, Joris ; Blaffart, Frédéric ; Turner, S. ; Idrissi, Hosni. On the origin of damped electrochemical oscillations at silicon anodes (revisited). In: ChemPhysChem : a European journal of chemical physics and physical chemistry, Vol. 15, no. 14, p. 3166-3124 (2014)
Permanent URL http://hdl.handle.net/2078.1/145342