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Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline Pd thin films
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Document type | Article de périodique (Journal article) – Article de recherche |
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Access type | Accès restreint |
Publication date | 2013 |
Language | Anglais |
Journal information | "Thin Solid Films" - Vol. 539, p. 145-150 |
Peer reviewed | yes |
Publisher | Elsevier S.A. ((Switzerland) Lausanne) |
issn | 0040-6090 |
e-issn | 1879-2731 |
Publication status | Publié |
Affiliations |
UCL
- SST/ICTM/ELEN - Pôle en ingénierie électrique UCL - SST/IMMC/IMAP - Materials and process engineering |
Keywords | Palladium ; Thin Film ; Deposition rate ; Twin boundary ; Texture ; Grain boundary |
Links |
Bibliographic reference | Amin-Ahmadi, B. ; Idrissi, Hosni ; Galceran, M ; Colla, Marie-Stéphane ; Raskin, Jean-Pierre ; et. al. Effect of deposition rate on the microstructure of electron beam evaporated nanocrystalline Pd thin films. In: Thin Solid Films, Vol. 539, p. 145-150 |
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Permanent URL | http://hdl.handle.net/2078.1/141386 |