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Synthesis and self-assembly of diblock copolymers bearing 2-nitrobenzyl photocleavable side groups

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Schumers , Jean-Marc [UCL] Bertrand, Olivier [UCL] Fustin, Charles-André [UCL] Gohy, Jean-François [UCL]

The light-responsive behavior in solution and in thin films of block copolymers bearing 2-nitrobenzyl photocleavable esters as side groups is discussed in this article. The polymers were synthesized by grafting 2-nitrobenzyl moieties onto poly(acrylic acid)-block-polystyrene (PAA-b-PS) precursor polymers, leading to poly(2-nitrobenzyl acrylate-random-acrylic acid)-block-polystyrene (P(NBA-r-AA)-b-PS) block copolymers. The UV irradiation of the block copolymers in a selective solvent for PS led to the formation of micelles that were used to trap hydrophilic molecules inside their core (light-induced encapsulation). In addition, thin films consisting of light-responsive P(NBA-r-AA) cylinders surrounded by a PS matrix were achieved by the self-assembly of P(NBA-r-AA)-b-PS copolymers onto silicon substrates. Exposing these films to UV irradiation generates nanostructured materials containing carboxylic acids inside the cylindrical nanodomains. The availability of these chemical functions was demonstrated by reacting them with a functional fluorescent dye. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011 Light-responsive poly(2-nitrobenzyl acrylate-random-acrylic acid)-block-polystyrene (P(NBA-r-AA)-b-PS) block copolymers (P(NBA-r-AA)-b-PS) have been synthesized and further self-assembled in solution as well as in thin films. In solution, the block copolymers were used to encapsulate hydrophilic molecules inside the core of light-induced micelles. In addition, light-responsive nanostructured thin films have been prepared onto silicon substrates. Exposing these films to UV irradiation generates chemical functionalities inside the photo-responsive nanodomains. Copyright © 2011 Wiley Periodicals, Inc.

Document type Article de périodique (Journal article) – Article de recherche
Access type Accès restreint
Publication date 2012
Language Anglais
Journal information "Journal of Polymer Science. Part A, Polymer Chemistry" - Vol. 50, no. 3, p. 599-608 (2012)
Peer reviewed yes
Publisher JohnWiley & Sons, Inc. ((United States) Hoboken)
issn 0887-624X
e-issn 1099-0518
Publication status Publié
Affiliation UCL - SST/IMCN/BSMA - Bio and soft matter
Keywords Atom transfer radical polymerization (ATRP) ; Fluorescent dyes ; Hydrophilic molecules ; Matrix ; Microencapsulation ; Nano domain ; Photocleavable group ; Poly(acrylic acid ) ; Precursor polymers ; Selective solvents ; Silicon substrates ; Micelles ; Stimuli-sensitive polymers ; UV irradiation ; Block copolymers ; Carboxylic acids ; Encapsulation ; Free radical reactions ; Functional polymers ; Irradiation ; Micelles ; Polystyrenes ; Microencapsulation ; Self assembly ; Thin films ; Atom transfer radical polymerization ; Photocleavable group ; Self-assembly ; Stimuli-sensitive polymers ; Thin films ; 2-nitrobenzyl ; Chemical functions
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Bibliographic reference Schumers , Jean-Marc ; Bertrand, Olivier ; Fustin, Charles-André ; Gohy, Jean-François. Synthesis and self-assembly of diblock copolymers bearing 2-nitrobenzyl photocleavable side groups. In: Journal of Polymer Science. Part A, Polymer Chemistry, Vol. 50, no. 3, p. 599-608 (2012)
Permanent URL http://hdl.handle.net/2078.1/125670